Please use this identifier to cite or link to this item: http://cris.utm.md/handle/5014/224
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dc.contributor.authorTSIULYANU, D.en_US
dc.contributor.authorMOCREAC, O.en_US
dc.contributor.authorAFANASIEV, A.en_US
dc.date.accessioned2020-03-21T14:23:05Z-
dc.date.available2020-03-21T14:23:05Z-
dc.date.issued2019-
dc.identifier.urihttp://repository.utm.md/handle/5014/5959-
dc.identifier.urihttp://cris.utm.md/handle/5014/224-
dc.description.abstractMicrostructural peculiarities and gas (NO2) sensing properties of tellurium thin films dependent on the technological procedures of their physical grow are presented. The fabrication of the films was provided using thermal vacuum evaporation method but the investigation were focused to establish the interdependence between the technological conditions of their growth process and both structure / morphology and gas sensing properties. Tellurium (purity 99.999 %) based thin films have been prepared using different grow rates (10 - 40 nm/s) onto Pyrex glass, sintered alumina (Al2O3) or Si/SiO2 substrates.en_US
dc.language.isoenen_US
dc.relation15.817.02.29A. Multifunctional nanomaterials and nanoelectronic devices based on nitrides, oxides and chalcogenides for biomedicine / Nanomateriale multifuncţionale şi dispozitive nanoelectronice în bază de nitruri, oxizi şi calcogenuri pentru biomedicinăen_US
dc.titleNanocrystalline and amorphous tellurium films for gas sensing applicationsen_US
dc.typeArticleen_US
dc.relation.conferenceANC-9en_US
item.grantfulltextopen-
item.languageiso639-1other-
item.fulltextWith Fulltext-
crisitem.author.deptDepartment of Physics-
crisitem.author.deptDepartment of Physics-
crisitem.author.orcid0000-0003-3711-4434-
crisitem.author.orcid0000-0002-4362-4556-
crisitem.author.parentorgFaculty of Electronics and Telecommunications-
crisitem.author.parentorgFaculty of Electronics and Telecommunications-
crisitem.project.grantno15.817.02.29A-
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