Please use this identifier to cite or link to this item: http://cris.utm.md/handle/5014/176
Title: Electrochemical Deposition by Design of Metal Nanostructures
Authors: MONAICO, Eduard 
MONAICO, Elena 
URSAKI, Veaceslav 
TIGINYANU, Ion 
NIELSCH, Kornelius 
Keywords: porous semiconductor;electroplating;au nanodots;arrays of nanopores;controlled electrodeposition
Issue Date: 2019
Source: Monaico, E., Monaico, E.I., Ursaki, V.V. et al. Electrochemical Deposition by Design of Metal Nanostructures. Surf. Engin. Appl.Electrochem. 55, 367–372 (2019)
Journal: Surface Engineering and Applied Electrochemistry 
Abstract: 
We report on the application of specially-designed masks for the purpose of electrochemical etching of InP single crystals which enables one to change in a controlled fashion the direction of propagation of pores, including those propagating in directions parallel to the top surface of substrates. The fabricated templates have been used to electrochemically deposit metallic nanostructures along predefined directions and to develop two-dimensional arrays of metallic nanotubes or nanowires embedded in semiconductor matrices.
URI: http://cris.utm.md/handle/5014/176
ISSN: 1068-3755
DOI: 10.3103/S1068375519040070
Appears in Collections:Journal Articles

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