Please use this identifier to cite or link to this item: http://cris.utm.md/handle/5014/2030
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dc.contributor.authorLUNGU, Ionen_US
dc.contributor.authorGHIMPU, Lidiaen_US
dc.contributor.authorPOTLOG, Tamaraen_US
dc.contributor.authorMEDVIDS, A.en_US
dc.contributor.authorMOISE, Calinen_US
dc.date.accessioned2023-11-28T22:49:30Z-
dc.date.available2023-11-28T22:49:30Z-
dc.date.issued2022-
dc.identifier.citationLungu, I., Ghimpu, L., Potlog, T., Medvids, A., Moise, C. (2022). Phase Transition in Laser Irradiated TiO2 Thin Films. In: Tiginyanu, I., Sontea, V., Railean, S. (eds) 5th International Conference on Nanotechnologies and Biomedical Engineering. ICNBME 2021. IFMBE Proceedings, vol 87. Springer, Cham. https://doi.org/10.1007/978-3-030-92328-0_6en_US
dc.identifier.isbn978-3-030-92327-3-
dc.identifier.isbn978-3-030-92328-0-
dc.identifier.urihttp://cris.utm.md/handle/5014/2030-
dc.description.abstractIn this study, the laser processing of thermally annealed TiO2 thin films at 420 ℃ in hydrogen atmosphere, utilizing an pulsed fourth-harmonic generation Nd: YAG laser employing different laser intensities in the atmosphere at room temperature, has been reported. Further, the surface morphology and crystalline structure have been investigated by means of atomic force microscopy [AFM], X-ray diffraction [XRD], Raman analysis. The AFM images obtained show that the film’s surface changes as the effect of the laser processes. Moreover, XRD and Raman analysis of the TiO2 thin films indicate at the threshold laser intensity, Ith = 66 MW/cm2 of the fourth-harmonic generation Nd: YAG laser phase transition from atanase-rutile to a crystalline 100% rutile.en_US
dc.language.isoenen_US
dc.publisherSpringer, Chamen_US
dc.relation20.80009.5007.16en_US
dc.subjectRF magnetron sputtering methoden_US
dc.subjectTiO2 thin filmsen_US
dc.subjectLaser processingen_US
dc.subjectXRDen_US
dc.subjectRaman analysisen_US
dc.titlePhase Transition in Laser Irradiated TiO2 Thin Filmsen_US
dc.typeArticleen_US
dc.relation.conferenceNanotechnologies and Biomedical Engineeringen_US
dc.identifier.doi10.1007/978-3-030-92328-0_6-
item.grantfulltextopen-
item.fulltextWith Fulltext-
item.languageiso639-1other-
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