Please use this identifier to cite or link to this item: http://cris.utm.md/handle/5014/1454
Title: Controlled Electroplating of Noble Metals on III-V Semiconductor Nanotemplates Fabricated by Anodic Etching of Bulk Substrates
Authors: MONAICO, Elena I. 
MONAICO, Eduard V. 
URSAKI, Veaceslav 
TIGINYANU, Ion 
Keywords: pulsed electrodeposition;nanotubes;nanodots;porous template;varicap device;site‐selective deposition
Issue Date: 2022
Source: Monaico, E.I.; Monaico, E.V.; Ursaki, V.V.; Tiginyanu, I.M. Controlled Electroplating of Noble Metals on III‐V Semiconductor Nanotemplates Fabricated by Anodic Etching of Bulk Substrates. Coatings 2022, 12, 1521. https://doi.org/10.3390/ coatings12101521
Project: NanoMedTwin - Promoting smart specialization at the Technical University of Moldova by developing the field of Novel Nanomaterials for BioMedical Applications through excellence in research and twinning (#810652) 
20.80009.5007.20. Nanoarhitecturi în bază de GaN şi matrici tridimensionale din materiale biologice pentru aplicaţii în microfluidică şi inginerie tisulară 
21.00208.8007.15/PD. Micro- și nano-ingineria compușilor semiconductori în baza tehnologiilor electrochimice pentru aplicații electronice si fotonice 
Journal: Coatings
Abstract: 
Porous templates are widely used for the preparation of various metallic nanostructures. Semiconductor templates have the advantage of controlled electrical conductivity. Site-selective deposition of noble metal formations, such as Pt and Au nanodots and nanotubes, was demonstrated in this paper for porous InP templates prepared by the anodization of InP wafers. Metal deposition was performed by pulsed electroplating. The produced hybrid nanomaterials were characterized by scanning electron microscopy (SEM) and energy dispersive X-ray analysis (EDX). It was shown that uniform deposition of the metal along the pore length could be obtained with optimized pulse parameters. The obtained results are discussed in terms of the optimum conditions for effective electrolyte refreshing and avoiding its depletion in pores during the electroplating process. It was demonstrated that the proposed technology could also be applied for the preparation of metal nanostructures on porous oxide templates, when it is combined with thermal treatment for the oxidation of the porous semiconductor skeleton.
Description: 
2022, 12, 1521
URI: http://cris.utm.md/handle/5014/1454
DOI: 10.3390/coatings12101521
Appears in Collections:Journal Articles

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